Imaging Budgets for Extreme Ultraviolet Optics: Ready for 22-nm Node and Beyond (Journal Paper)
Authors: Marc Bienert, Aksel Göhnermeier, Oliver Natt, et al.
Published: 01 Oct 2009

Imaging Budgets for EUV Optics: Ready for 22-nm Node and Beyond (Conference Proceedings)
Authors: Marc Bienert, Aksel Göhnermeier, Oliver Natt, et al.
Published: 18 Mar 2009

Orientation Zernike Polynomials: A Systematic Description of Polarized Imaging Using High NA Lithography Lenses (Conference Proceedings)
Authors: Tilmann Heil, Johannes Ruoff, Jens Neumann, et al.
Published: 04 Dec 2008

Performance of a 1.35 NA ArF Immersion Lithography System for 40-nm Applications (Conference Proceedings)
Authors: Jos de Kierk, Christian Wagner, Richard Droste, et al.
Published: 27 Mar 2007

Polarization Influence on Imaging (Journal Paper)
Authors: Michael Totzeck, Paul Gräupner, Tilmann Heil, et al.
Published: 01 Jul 2005

Predictive Modeling of Advanced Illumination Pupils Used as Imaging Enhancement for Low k1 Applications (Conference Proceedings)
Authors: Tilmann Heil, Paul Gräupner, Reiner Garreis, et al.
Published: 28 May 2004

EUV Imaging Aerial Image Study (Conference Proceedings)
Authors: Martin Lowisch, Udo Dinger, Uwe Mickan, et al.
Published: 20 May 2004

How to Describe Polarization Influence on Imaging (Conference Proceedings)
Authors: Michael Totzeck, Paul Gräupner, Tilmann Heil, et al.
Published: 12 May 2004

Imaging Enhancements by Polarized Illumination: Theory and Experimental Verification (Conference Proceedings)
Authors: Carsten Kohler, Wim de Boell, Koen van Ingen-Schenau, et al.
Published: 12 May 2004

Impact of Wavefront Errors on Low k1 Processes at Extremely High NA (Conference Proceedings)
Authors: Paul Gräupner, Reiner Garreis, Aksel Göhnermeier, et al.
Published: 26 Jun 2003

Fabrication of Freeform Mirrors: Metrology and Figuring
Authors: H. Thiess and H. Lasser

New Products For Synchrotron Application
Based On Novel Surface Processing Developments
Author: Andreas Seifert

ACTOP 2008: Presentation
Author: H. Thiess

Weitere Publikationen:

•  H. Thiess, H. Lasser, F. Siewert: "Fabrication of X-ray mirrors for Synchrotron Applications, Nuclear Instruments and Methods in Physics Research Section 2009", ISSN 0168-9002, DOI: 10.1016/j.nima.2009.10.077.

•  B. Nelles, K.F. Heidemann, B. Kleemann: “Design, Manufacturing and Testing of Gratings for Synchrotron Radiation”; Invited Talk at SRI 2000, Berlin

•  M.P. Kowalski, T.W. Barbee,Jr., K.F. Heidemann, H. Gursky, J.C. Rife, W.R. Hunter, G.G. Fritz, and R.G. Cruddace: "Efficiency Calibration of the First Multilayer-Coated Holographic Ion-Etched Grating for a Sounding Rocket High-Resolution Spectrometer" Appl. Opt. 38, 6487-6493, 1999

•  Karlfrid Osterried, Klaus Frieder Heidemann, and Bruno Nelles: ”Groove Profile Modification of Blazed Gratings by Dip Coating with Hardenable Liquids” Appl. Opt., Vol. 37, No.34, Dec. 1, 1998

•  M. P. Kowalski, R. G. Cruddace, J. F. Seely, J. C. Rife, K. F. Heidemann, U. Heinzmann, U. Kleineberg, K. Osterried, D. Menke, and W. R. Hunter: “Efficiency of a Multilayer-Coated, Ion-Etched Laminar Holographic Grating in the 14.5-16.0nm Wavelength Region”, Optics Letters, Vol. 22, Nr. 11, June 1, 1997

•  G. Derst, H. Handschuh, M. Schmidt, K. Werner: ”Fabrication and Metrology of High Quality Synchrotron Mirrors in the Sub-Arcsec Regime” Proc. SPIE Vol. 3152: Materials, Manufacturing and Measurement for Synchrotron Radiation Mirrors; Peter Z. Takacs; Thomas W. Tonnessen; Eds.; p.51-58, October 1997

•  U. Kleineberg, H.-J. Stock, A. Kloid, K. Osterried, D. Menke, B. Schmiedeskamp, U. Heinzmann, D. Fuchs, G. Ulm, K. Heidemann, and B. Nelles: "Mo/Si Multilayer Coated Laminar Phase and Ruled Blaze Gratings for the Soft X-Ray Region"; J. Electron Spectrosc. Related Phenom. 80, 389-392, 1996

•  Kurt B. Becker: Fabrication Technologies for ”Perfect Optics”.

•  Klaus Frieder Heidemann: ”Holographically Recorded Ion Beam Etched Laminar Grating with Groove Density Variation on Spherical Fused Silica Blank”.