Extreme ultra violett photomask qualification

The high volume device manufacturing infrastructurebased on EUVL technology requires defect-free EUV mask manufacturing as one of its foundations. SEMATECH initiated EMI, the EUV Mask Infrastructure program, which has identified an actinic measurement system for the printability analysis of EUV mask defects to ensure defect free mask manufacturing and cost-effective high-volume EUV production.


The concept and feasibility study for the AIMS™ EUV resulted in a feasible tool concept for defect printability review. The main development program for the AIMS™ EUV has been started at Carl Zeiss leading to a commercialized tool available in 2014.