Advanced critical dimension control

The CDC32 system improves Critical Dimension Uniformity (CDU) across photomasks with high repeatability and precision. This optimizes intra-field wafer CD uniformity in the lithographic processes and guarantees highest yield for all relevant technology nodes.


The tool can be used with all existing or upcoming optical mask types and technologies such as binary masks and PSMs as well as inverse lithography, SMO and OMOG masks including double patterning.


The CDC32 system improves the yield by bringing masks back into CD Uniformity specifications. It enables to leverage existing installed mask manufacturing equipment for future nodes. CDC32 processed masks are proven to significantly enhance wafer yield and improve product binning when one or more critical layers are processed.


The system allows to process masks in mask shop as well as in a wafer fab mask room, with or without pellicle.

Closed loop CDC32 & WLCD

Measure and improve the critical dimension uniformity

The CDC32 & WLCD closed loop solution enables mask shops to bring an out-of-spec mask into spec again. The mask does not need to be rewritten, which saves time and costs and therefore improves mask shop yield.


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