A new era of registration and overlay control

RegC® enables registration and overlay improvement on patterned masks after writing and pellicilization. Registration control by RegC® can be done by correcting each individual mask registration towards its intended ideal values – or by correcting pairs of masks purposely towards mask to mask overlay.


RegC® helps to meet the advanced mask image placement (IP) and wafer overlay specifications for DP and for EUV immersion match. There is no need to rewrite a mask due to registration errors which leads to shorter turnaround time reduced costs.


New challenging mask to mask overlay specifications can be met with RegC®. It allows to match registration footprints of different writing tools as well as exposure tools.