2010-07-29: PROVE™ Achieves Milestone
SEMATECH and Carl Zeiss demonstrate mask pattern alignment and registration to enable double patterning lithography
2010-07-07: Nano Image Contest.
Carl Zeiss Nano Image Contest Off to a Successful Start
2010-07-08: SEMATECH and Carl Zeiss to Develop First-Ever EUV Aerial Imaging Tool
Agreement reached to accelerate development of
EUV inspection tool to target mask defects for 22 nm half-pitch node and below
2010-06-16: Supplier's Day 2010.
3rd Suppliers’ Day at Carl Zeiss Semiconductor Technology
